Silicon Nitride ( Si3N4 )
LPCVD silicon nitride as insulation layers application, SWI can offer LPCVD silicon nitride at different stress level with high thickness uniformity and etch rates.
1. Stoichiometric nitride ( >800 Mpa )
2. Low stress nitride ( <250 Mpa )
3. Super low stress nitride ( <100 Mpa )
Metal PVD Deposition
SWI provides more than 100 sputter target materials for the vacuum coating use . Our metal film deposition service includes single layer and/or the combination of the following elements:
Ta, TaN, Cu, Ti, TiN, Al, Al-Si-Cu, Al-Cu, Al-Si, TiW, W, WN, WSi, and Cr.
Multiple Film Stack
SWI can stack multiple film to silicon wafer . we combine and stack oxide, nitride and metal film onto the same silicon substrate .
1. Silicon wafer + SiO2
2. Silicon wafer + SiO2 + Si3N4
3. Silicon Wafer + Cr + Au
4. Silicon Wafer + SiO2 + Ta + Cu