MgO Wafer



Semiconductor Wafer Inc ( SWI ) provides high quality single crystal MgO wafer produced by arc melting method for making ferroelectric thin film , high Tc superconductor as well as for optoelectronics  applications  in maximum diameter up to 2 inch .

MgO wafer can be fabricated in round or square shape , with a SEMI flat or without flat , one side polished or two sides polished , size from 10 x10 mm to 2 " , thickness range from 0.4 , 0.5 , 1 to 2 mm , surface are epi polished with low surface roughness .

We have twin free and defect free MgO substrate with various orientation <100> , <110> and  <111> , and high precision surface finish , please contact us for more product information . 



MgO Wafer Features
MgO Wafer Applications

Low dielectric loss  
Cleavage plane on the <100>



High Tc Superconductor 
Electronics and optoelectronics  
Microwave device
Standard Specifications
 Growth method Arc Fusion
 Crystal structure Cubic
 Orientation <100> , <110> , <111>
 Dielectric constant 9.8
 Lattice constant 4.212 A
 Size
Ø 1" / 2"
10 x 10 , 20 x 20 , 30 x 30 mm
 Thickness 0.5 mm , 1 mm
 Surface finish one side polished
two sides polished
 Surface roughness < 10 A

 

         
         
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