Quartz Wafer



Semiconductor Wafer Inc is a leading supplier of high quality clear quartz substrate , including fused silica wafer and fused quartz wafer in UV grade , optical grade and semiconductor grade .

These quartz wafer are produced by flame fused and electrically fused technique , due to it's high purity, low  thermal expansion , high tensile strength , high optical transmission and unique electrical properties , SWI quartz wafer is suitable for a wide range of laboratory use and high-tech semiconductor process application .

Please contact us for more product information .



Quartz Wafer Features :
Quartz Wafer Applications :

High working temperature
Good thermal conductivity
High stability
High anti corrosion
Superior mechanical properties
Stable dielectric constant &
low dielectric loss
High optical transmission


Photo mask blank
Sensors
High frequency circuit
( Microwave circuit )
Biotech arrays
Laser Optics
Optical windows and lenses

Purity Level 99.999 % SiO2 Quartz Wafer
Diameter
Ø 1" / 2" / 3" / 4" / 6" / 8"
Thickness
0.5 mm , 1 mm , 2 mm , 3 mm
Surface finish
one side or two sides polished
Flat
One flat as SEMI. Std.
TTV
<= 20 um
Surface roughness
Ra <= 15 A
Mechanical Properties
Density
2.2 g / cm3
Pressure-proof Intensity
1100 Mpa
Anti-curving Intensity
67 Mpa
Anti-pull Intensity
48 Mpa
Poisson's ratio
0.14 ~ 0.17
Young's modulus
72000 Mpa
Rigidity modulus
31000 Mpa
Moh's hardness
5.5 ~ 6.5
Thermal Properties
Transformation point
1120 °C
Softening point
1680 °C
Annealing point
1210 °C
Specific heat ( 20 ~ 350 °C )
670 J / kg °C
Thermal conductivity ( 20 °C )
1.4 W / m °C
Thermal expansion coefficient
5.5×10 -7 cm / cm °C
Thermal processing temperature
1700 ~ 2000 °C
Short-term operating temperature
1300 °C
Long-term operating temperature
1100 °C
Electrical Properties
Resistivity
7×10 7 ohm-cm
Insulating strength
250 ~ 400 Kv / cm
Dielectric constant e
3.7~ 3.9
Dielectric absorption coefficient.
< 4×10 4
Dielectric waste coefficient.
< 1×10 4
Optical Properties
Refractive index ( @ 589 nm )
Nd =1.4584
What's the difference ?
Fused silica wafer
( Synthetic silica )
Fused quartz wafer
( Natural silica )
High OH content >1200
Excellent optical properties
Higher transmission in the UV range
Free bubbles, inclusions and contaminants.
Very low fluorescence
Impurity 5 ppm
Low OH content > 150
Excellent thermal properties
Contain some bubbles , inclusions and contaminants
High fluorescence
Impurity 20 ~ 40 ppm
Optical Transmission %
Wave length
( nm )
Fused silica wafer
( Synthetic silica )
Fused quartz wafer
( Natural silica )
190
86.42
73.84
200
86.88
75.16
210
88.51
79.90
220
89.09
85.69
230
89.58
87.57
240
89.90
87.58
250
90.12
88.64
260
90.46
90.11
280
90.89
90.82
300
91.14
91.15
350
91.49
91.45
400
91.72
91.75
500
92.08
91.99
750
92.26
92.32
1000
92.52
92.48
2000
93.25
93.48
2500
91.58
93.56

 

         
         
  Choosing product Our clients Request for Quote
Ordering information
         
         
  Wafer & Substrate Customer Contact us
  Sputter target Google Scholar Why choose us
  More ....
   
         
 
?? PayPal ???
         
© 2015 ~ 2020 Semiconductor Wafer , Inc . All Rights Reserved