Alumina Wafer




Alumina Wafer




Alumina Wafer




Alumina Wafer






SINCE 2002

Research & Innovation


Semiconductor Wafer Inc. ( SWI ) provides alumina ( Al2O3 ) ceramic substrates . Al2O3 substrate is one of the most popular ceramic substrate which has excellent heat resistance, high mechnical strength , abrasion resistance and small dielectric loss . The surface of alumina substrate is quite smooth and low porosity , 99.6% alumina substrate is suitable for thin film device , 96% alumina substrate is suitable for thick film device application. SWI provides alumina ceramic substrates for a wide range of applications, including thin film and thick film microelectronic , high power and high frequency circuit RF / microwave components and capacitor or resistor , contact us for more ceramic wafer product information .







Alumina Wafer Properties


Chemical formula Al2O3                                                                                                                                    
Color white
Density 3.72  g/cm 3
Thermal conductivity 22.3   W/m. K
Thermal Expansion ( x10 -6 / ℃ ) 8
Dielectric strength 14E6
Dielectric Constant (at 1MHZ) 9.5
Loss Tangent (x10 -4 @1MHZ) 3
Volume Resistivity >1E14  ohm-cm

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Product Specification


Diameter         Ø 1" / Ø 2" / Ø 3" / Ø 4"    
Square size 10 x 10 / 20 x 20 / 50 x 50 / 100 x 100 mm
Thickness 0.4 mm / 0.5 mm / 1 mm
Surface As fired
  one side polished / two sides polished
Roughness Ra <= 0.3 um

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