AlN Wafer




AlN Wafer




AlN Wafer




AlN Wafer






SINCE 2002

Research & Innovation


Semiconductor Wafer Inc. ( SWI ) provides AlN ceramic substrate . AlN substrate is one of the most popular ceramic substrate which has excellent heat resistance, high mechnical strength , abrasion resistance and small dielectric loss . The surface of AlN substrate is quite smooth and low porosity . Aluminium Nitride has higher thermal conductivity , compared to alumina substrate , It is about 7 to 8 times high . AlN substrate is an excellent electronic package material . SWI provides AlN substrate for a wide range of applications, including thin film and thick film microelectronic , high power and high frequency circuit RF / microwave components and capacitor or resistor , contact us for more ceramic wafer product information .







AlN Wafer Properties


Chemical formula AlN                                                                                                                                
Color Gray
Density 3.3  g/cm 3
Thermal conductivity 160 ~ 190   W/m. K
Thermal Expansion ( x10 -6 / ℃ ) 4.6
Dielectric strength 14E6
Dielectric Constant (at 1MHZ) 8.7
Loss Tangent (x10 -4 @1MHZ) 5
Volume Resistivity >1E14  ohm-cm

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Product Specification


Diameter         Ø 1" / Ø 2" / Ø 3" / Ø 4"    
Square size 10 x 10 / 20 x 20 / 50 x 50 / 100 x 100 mm
Thickness 0.4 mm / 0.5 mm / 1 mm
Surface As fired
  one side polished / two sides polished
Roughness Ra <= 0.3 um

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